Epson Digital Couture returned to fashion week featuring 11 new designers.
The tech company invited the designers to utilize their direct to garment technology and digital dye sublimation printing with the Epson SureColor F-Series printers. This years theme was “Harmony and Peace Through Fashion.”
The group consisted of 11 hand selected designers from the Americas; Chloe Trujillo from Los Angeles, Cristina Ruales from Brooklyn, Fabrizzio Berrocal from Costa Rica, GM by Gustavo Moscoso from Ecuador, Kaleidoscopic by María de Lourdes Ramírez and Isabel Navarro Landa from Mexico, LENERD by Felipe Santamaría Luque from Colombia, Matías Hernán from Chile, Ossira by Agostina Orlandi and Ludmila Osikovsky from Argentina, Pionier by Janet Ríos and Carmen Artica from Peru, Santika by Danny Santiago from Miami, Tigresse by Fabio Yukio from Brazil
The use of this style of printing allowed the designers to create and modify textile designs extremely easily this Epson technologies, rather than hands on work. The new approach allowed the designers to work on extremely fine details.
Designers utilized the tech to create intricate floral, geometric and bohemian prints on their garments. They presented their work at the showcase in New York City’s Skylight 60 Tenth. Epson is sure to challenging even more designers int he coming seasons to embrace and innovate with technology.